Retraction
Stress Relaxation Mechanism in the Si-SiO2 System and Its Influence on the Interface Properties
Paper Information
Record ID:
16510
Journal:
Publication Date:
July 19, 2016
Retraction Date:
November 22, 2017
(8.0 years years ago)
Subjects:
Institutions:
Countries:
Article Type:
Publisher:
Wiley
Open Access:
Yes
PubMed ID:
Not indexed in PubMed
Retraction PubMed ID:
Not indexed in PubMed
Retraction Details
Citations (1)
1
Total Citations1
Post-Retraction(100.0%)
0
Pre-Retraction0
Same DayPost-Retraction Citation Analysis
0
Within 30 days
0
Within 1 year
1
After 2+ years
922
Days since retraction (latest)
Paper citing Stress Relaxation Mechanism in the Si-SiO2 System ...
Unknown Authors
Unknown Journal
Published: Jun 2020
922 days after retraction
Quick Stats
Total Citations:
1
Years Since Retraction:
8.0 years
Open Access:
Yes
Last Checked:
Never