Retraction
Atomic simulation of deposition and etching on the surface of Si bombarded by energetic SiF3
Paper Information
Record ID:
22056
Author(s):
Journal:
Publication Date:
August 10, 2006
Retraction Date:
August 10, 2006
(19.3 years years ago)
Institutions:
- School of Material Engineering, Southwest University, Chongqing 400715, People's Republic of China
- School of Information Engineering, Guizhou University (Huaxi), 550025 Guizhou, People's Republic of China
- School of Information Engineering(Cai Jiaguan), 550025, University of Guizhou, Guizhou Province, People's Republic of China
Country:
🇨🇳 ChinaArticle Type:
Publisher:
IOP Publishing
Open Access:
Yes
PubMed ID:
Not indexed in PubMed
Retraction PubMed ID:
Not indexed in PubMed
Retraction Details
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Total Citations:
0
Years Since Retraction:
19.3 years
Open Access:
Yes
Last Checked:
Never