Retraction
Redistribution of infused and implanted dopants in a multilayer structure during annealing of dopant and radiation defects for the production of a system of p–n junctions
Paper Information
Record ID:
22769
Author(s):
Journal:
Publication Date:
August 04, 2008
Retraction Date:
April 01, 2009
(16.6 years years ago)
Subject:
Broad Categories:
Engineering
Engineering
Specific Fields:
Engineering - Electrical
Engineering - Electrical
Institution:
Institute for Physics of Microstructures of RAS, 603950 Nizhny Novgorod, GSP-105, RussiaCountry:
🇷🇺 RussiaArticle Type:
Publisher:
IOP Publishing
Open Access:
Yes
PubMed ID:
Not indexed in PubMed
Retraction PubMed ID:
Not indexed in PubMed
Retraction Details
Retraction Reason:
Nature of Retraction:
Retraction
Retraction Notice:
10.1088/0268-1242/24/4/049801Citations (0)
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Post-Retraction0
Pre-Retraction0
Same Day
No citations found for this paper.
Quick Stats
Total Citations:
0
Years Since Retraction:
16.6 years
Open Access:
Yes
Last Checked:
Never