Retraction
Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures
Paper Information
Record ID:
52928
Author(s):
Journal:
Publication Date:
November 23, 2023
Retraction Date:
February 28, 2024
(1.7 year years ago)
Subject:
Broad Categories:
Engineering
Engineering
Specific Fields:
Engineering - Mechanical
Engineering - Mechanical
Institution:
School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, ChinaCountry:
🇨🇳 ChinaArticle Type:
Publisher:
American Chemical Society (ACS)
Open Access:
Yes
PubMed ID:
Retraction PubMed ID:
Retraction Details
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Quick Stats
Total Citations:
0
Years Since Retraction:
1.7 year
Open Access:
Yes
Last Checked:
Jul 24, 2025